Gases   
 
     
Tetrafluoromethane CF4»  
TETRAFLUOROMETHANE
CF4 (R14 ) Gas Purity 99,999.
Name: Tetrafluoromethane
Symbol: CF4
Molecular Weight: 88,01 g/mol
CAS Registry ID:   75-73-0
UN Number: UN 1982

CF4 mainly used for plasma etching in various silicon films processes. Can be used alone or in combination with oxygen. Lower grades of CF4 are also available.


Qualitative performance
Halocarbon 14 CF4 % 99,999
Nitrogen N2 ppm 8,0
Oxygen O2 ppm 2,0
Halocarbon 116 C2F6 ppm 1,0
Carbon oxides CO+CO2 ppm 0,5
Sulfur hexafluoride SF6 ppm 0,5
Moisture H2O ppm 1,0
Acidity as HF wppm 0,1


Information about cylinders

Type of a cylinder Bulk, litreses Type of a valvees Operating pressurees, bar Net weightes, kg
B40 40 DIN 477/6 22 42
B50 50 DIN 477/6 22 50


Transport data

Chemical Symbol: CF4
CAS Registry ID: 75-73-0
Physical properties: A colorless, non-toxic, non-flammable gas
Hazard Class: 2.2
UN Number: UN 1982
Xenon, Xe »
Krypton, Kr »
Neon, Ne »
Helium, He »
Argon, Ar »
Octafluoropropane, C3F8 »
Octafluorocyclobutane, C4F8 »
Sulfur Hexafluoride, SF6 »
Silicon tetrafluoride, SiF4 »
Propen(Propylen), C3H6 »
Propan, C3H8 »
Butan »
Lasergases »
 
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