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Silicon tetrafluoride, SiF4 »  
SILICON TETRAFLUORIDE (SiF4)
Name: Silicon tetrafluoride
Symbol: SiF4
CAS Registry ID:   7783-61-1
UN Number: UN 1859

SiF4 is used for plasma etching of metal silicides, silicon films and in fiber-optic cables fabrication. Silicon tetrafluoride is also used in semiconductor manufacturing.

Qualitative performance

Silicon tetrafluoride SiF4 % 99,99
Hydrogen Fluoride HF vppm 50,0
Nitrogen N2 vppm 3,0
Oxygen O2 vppm 1,0
Carbon dioxide CO2 vppm 1,0
Carbon oxide CO vppm 0,5
Methane CH4 vppm 10
Arsenic As wppm 0,5
Phosphorus P wppm 0,5
Boron B wppm 0,5

Information about cylinders

Type of a cylinder Bulk, ltr. Type of a valves Operating pressures, bar Net weight, kg
B40 40 DIN 477/6 22 42
B50 50 DIN 477/6 22 50

Transport data

Chemical Symbol: SiF4
CAS Registry ID: 07783-61-1
Physical properties: Colorless, poisonous, corrosive gas
Hazard Class: 2.3 (poison gas)
UN Number: UN 1859
Xenon, Xe »
Krypton, Kr »
Neon, Ne »
Helium, He »
Argon, Ar »
Tetrafluoromethane, CF4 »
Octafluorocyclobutane, C4F8 »
Sulfur Hexafluoride, SF6 »
Octafluoropropane, C3F8 »
Propen(Propylen), C3H6 »
Propan, C3H8 »
Butan »
Lasergases »
 
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