Gases   
 
     
Octafluorpropane C3F8»  
OCTAFLUOROPROPANE (C3F8)
Name: Octafluorpropane
Symbol: C3F8
CAS Registry ID:   76-19-7
UN Number: UN 2424

Octafluorpropane C3F8 used for plasma etching of silicon films when higher selectivity required. Lower grades of C3F8 are also available.

Qualitative performance


OCTAFLUOROPROPANE (C3F8, R218, Halocarbon 218).
Gas Purity 99,999


Parameter Measure in Detection limit Critical value
Octafluorpropane
in liquid phase, min.

% vol.   99,999
Air* vppm 0,5 10
Water wppm 0,01 1,0
Acidity as HF wppm 0,01 0,1
Non-volatile residue wppm 0,5 10
Air*-means Nitrogen, Oxygen, Carbon Monoxide and Carbon Dioxide


OCTAFLUOROPROPANE (C3F8, R218, Halocarbon 218).
Gas Purity 99,96
.

Octafluoropropane C3F8 % 99,96
Moisture H2O wppm 10
Nitrogen N2 vppm 50
Oxygen O2 vppm 20
Carbon dioxide CO2 vppm 5
Carbon oxide CO vppm 5
Acidity as HF wppm 0,1

Information about cylinders

Type of a cylinder Bulk, litreses Type of a valvees Operating pressurees, bar Net weightes, kg
B40 40 DIN 477/6 22 42
B50 50 DIN 477/6 22 50

Transport data

Chemical Symbol: C3F8
CAS Registry ID: 76-19-7
Physical properties: A colorless, non-toxic, non-flammable gas
Hazard Class: 2.2
UN Number: UN 2424
Xenon, Xe »
Krypton, Kr »
Neon, Ne »
Helium, He »
Argon, Ar »
Tetrafluoromethane, CF4 »
Octafluorocyclobutane, C4F8 »
Sulfur Hexafluoride, SF6 »
Silicon tetrafluoride, SiF4 »
Propen(Propylen), C3H6 »
Propan, C3H8 »
Butan »
Lasergases »
 
  IMPRESSUM